The Hidden Clover Polo combines a refined palm leaf pattern with advanced Dry-Tech Performance technology. It offers moisture-wicking, quick-dry properties, wrinkle-free breathability, and unmatched softness-ideal for cool, comfortable, and stylish wear all day. Fit & Design: Short sleeve Collared Poly/Spandex Drytech Technology for comfort Super soft for maximum comfort Technology: Shape-retention technology for long-term wear Dry-Tech performance technology is moisture wicking and quick drying Wrinkle-resistant Additional Details: Low-Shrinkage for easy care